Discover our advanced Chemical Vapor Deposition (CVD) systems, engineered for precision thin-film material preparation. Ideal for applications like silicon carbide coating, ceramic substrate testing, ZrO nanostructure growth, and MLCC atmosphere sintering, our systems integrate a high-temperature vacuum tube furnace, a versatile multi-channel gas mixing system, and a high-vacuum unit capable of reaching up to 0.001mg. Featuring precise temperature control with accuracy up to ±1°C, uniform heating, and flexible gas delivery via float or mass flow meters, our CVD solutions offer unmatched performance and reliability. Customizable with options for computer monitoring, remote control, and various pumping configurations, we provide tailored systems to meet your specific research and production requirements.
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