Specifications
| Etcher Unit | Height: 300 mm (13 in) | 
|---|---|
| Width: 190 mm (7.5 in) | |
| Depth: 305 mm (12 in) | |
| Bottle Assembly | Height: 254 mm (10 in) | 
| Width: 280 mm (11 in) | |
| Depth: 127 mm (5 in) | |
| Weight | Approx. 16 kg (35 lb) | 
| Power Source | 90 to 250 VAC, 50 to 60 Hz (4 amp) | 
| Acid temp. range | 10° to 250° C | 
| Acid temp. set point | 1° C ± 1% of setting | 
| Etch cavity (up to) | 22 mm x 22 mm (30 mm diagonal) | 
| Choice of Acids | fuming nitric acids, mixed fuming nitric and sulfuric acids, or fuming/concentrated sulfuric acid | 
| Acid Mix Ratios | (nitric to sulfuric ratios) 9:1, 6:1, 5:1, 4:1, 7:2, 3:1, 5:2, 2:1, 3:2, 1:1, 1:2, 1:3, 1:4, 1:5 | 
| Post Etch Rinse Options | sulfuric acids, fuming nitric acids, mixed acids, or no rinse | 
| Etch Times | 1 to 2,400 seconds in 1 second increments (1 seconds to 40 minutes) dynamic (real time) adjustments of etch time | 
| Etchant Volume Selection | 1 to 8 ml per minute - for all acids & acid mixes | 
| Etch Delivery Functions | pulsed or Reciprocal Etch Acid Pulse (REAP) for lower acid consumption | 
| Operator Program Storage | 100 programs stored to nonvolatile memory | 
| Warranty | most comprehensive and inclusive warranty in industry (ask for full details) | 
 Malaysia
Malaysia