Brand: EXPEC Technology
Model: EXPEC 4850F
Product Type: Spark Optical Emission Spectrometer
Application: Quantitative elemental analysis of ferrous and non-ferrous metals
The EXPEC 4850F Spark OES Spectrometer is designed for rapid and accurate elemental composition analysis of solid metal samples.
Using spark optical emission spectroscopy, the instrument excites the prepared metal surface with an electrical discharge. Each element emits light at characteristic wavelengths, while the measured intensity is used to calculate its concentration in the sample.
The EXPEC 4850F is suitable for foundries, metal-processing plants, automotive-component manufacturers, steel and aluminium producers, incoming-material inspection, scrap sorting, alloy verification and metallurgical laboratories.
The system combines full-spectrum measurement, multi-CMOS detector technology, programmable digital excitation and dual-optics design. Its UV optical system is specifically intended to improve the analysis of important light elements such as carbon, phosphorus, sulphur and nitrogen.
Redmark Industry Sdn Bhd supplies EXPEC Spark OES systems in Malaysia with application consultation, base and element configuration, installation, operator training, method support and after-sales technical coordination.
The analysis process generally includes:
In optical emission spectroscopy, the wavelength identifies the element while the emitted-light intensity is related to its concentration.
The EXPEC 4850F is suitable for:
Depending on the selected calibration and ordered configuration, the EXPEC 4850F may be configured for metal bases such as:
The final base package, element list, analytical range and detection limits must be confirmed before order placement.
◆ Full-spectrum optical emission measurement
◆ Paschen-Runge visible optical system
◆ Multi-CMOS detector technology
◆ Dedicated UV optics for light-element analysis
◆ Improved analysis of carbon, phosphorus, sulphur and nitrogen
◆ Programmable pulse digital excitation source
◆ Spark, arc and combined discharge waveforms depending on the metal base
◆ Multi-line analysis to support measurement across a wider concentration range
◆ Intelligent spectrum-matching function
◆ Guided standardisation procedure
◆ One-touch routine operation
◆ Fast sample analysis
◆ Compact benchtop design
◆ Low electrical-power requirement
◆ Fast instrument preparation time
◆ Argon-flushed spark stand
◆ Optimised argon flow
◆ Durable electrode system
◆ Adjustable sample clamp for different sample geometries
◆ Optional small-sample adaptor
◆ Suitable for ferrous and non-ferrous metal analysis
The EXPEC 4850F uses separate optical arrangements for visible and ultraviolet wavelengths.
The visible optical system uses a Paschen-Runge arrangement with broad wavelength coverage and multi-CMOS detectors.
The dedicated UV optical system is designed to enhance the measurement of:
The EXPEC 4850F records broad spectral information rather than relying only on a limited number of fixed channels.
Potential advantages include:
The instrument covers a stated wavelength range of approximately 165nm to 760nm, with many metal-analysis wavelengths located between 170nm and 450nm.
Different spectral lines may perform better at different concentration levels.
The EXPEC platform uses multi-line analysis to select or combine suitable lines, helping reduce the effect of:
The brochure positions multi-line analysis as a method for improving accuracy across a wider concentration range.
The EXPEC 4850F includes intelligent spectrum-matching functionality that uses full-spectrum data to compensate for spectral drift.
This may reduce dependence on repeated manual channel correction and improve long-term analytical stability.
The manufacturer describes this function as automatically matching shifted spectra using the information available from the full spectrum.
Stable optical temperature is important for repeatable OES measurement.
The brochure reports:
These values should be treated as manufacturer test data rather than universal guaranteed performance for every element, matrix and operating environment.
The EXPEC 4850F uses a compact optical system with argon purification.
The brochure states that the instrument may be ready for use in approximately 20 minutes, compared with longer preparation times associated with larger traditional optical or vacuum systems.
A separate example in the brochure states approximately 20 seconds for analysis of an Al 6063 sample under the illustrated test conditions. Actual analysis time depends on the method, pre-burn, integration cycles, element configuration and sample condition.
The software is designed to support both routine production testing and advanced method management.
Key functions include:
The EXPEC 4850 platform is presented as a compact and low-power spectrometer.
The brochure provides the following platform-level reference figures:
| Parameter | Reference Value |
|---|---|
| Approximate dimensions | 0.7 × 0.6 × 0.4m |
| Approximate weight | 80kg |
| Approximate power | 0.4kW |
| Parameter | Specification |
|---|---|
| Brand | EXPEC Technology |
| Model | EXPEC 4850F |
| Instrument type | Spark optical emission spectrometer |
| Measurement method | Optical emission spectroscopy |
| Detector | Multi-CMOS |
| Optical system | Dual optics |
| Visible optics | Paschen-Runge optical system |
| UV optics | Dedicated UV optical system |
| Wavelength range | Approximately 165–760nm |
| Excitation source | Programmable pulse digital source |
| Discharge modes | Spark, arc or combined waveform depending on method |
| Spark chamber | Argon-flushed |
| Sample clamp | Adjustable for different geometries |
| Software | One-touch analysis and guided standardisation |
| Preparation time | Approximately 20 minutes under stated conditions |
| Typical platform weight | Approximately 80kg |
| Typical platform power | Approximately 0.4kW |
| Installation | Benchtop laboratory or production QA/QC area |
| Gas requirement | High-purity argon |
Final specifications depend on the selected metal bases, element package, software configuration and ordered accessories.
Spark OES requires high-purity argon to provide:
For project planning, customers should confirm:
Reliable Spark OES analysis requires a clean, flat and representative sample surface.
Typical preparation equipment may include:
Cross-contamination should be controlled by using suitable grinding media and separate preparation procedures for different metal bases where necessary.
The sample should normally:
An optional small-sample adaptor may be used for wires, small parts and irregularly shaped samples.
The brochure shows dedicated adaptors intended to support testing of smaller or unusual sample geometries.
Application feasibility must be confirmed based on:
An OES spectrometer does not automatically analyse every alloy base.
The following must be confirmed:
The EXPEC 4850F is technically positioned for improved C, P, S and N analysis through dedicated UV optics.
However, achievable performance depends on:
Do not guarantee trace-level detection limits without an element-by-element application review.
Each metal base and spectral line has different analytical capability.
High-purity metal analysis may require specialised calibration ranges and certified reference materials.
A standard alloy calibration package may not be suitable for four-decimal or ultra-trace concentration requirements.
Spark OES is minimally destructive. Each analysis produces a visible spark burn on the sample surface.
The grade library compares measured chemistry with stored specifications. It does not replace review by a qualified metallurgist where heat-treatment condition, mechanical properties or product standards are also relevant.
The customer should prepare:
Final site requirements should follow the approved installation checklist.
Redmark Industry Sdn Bhd provides local technical and commercial support for EXPEC Spark OES systems in Malaysia, including:
Send Redmark Industry your metal bases, alloy grades, target elements, expected concentration ranges and required detection limits.
Our technical team will evaluate the application and recommend a suitable EXPEC 4850F configuration.
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