DLAB HB150-S2 LED Digital Double Modules Dry Bath
The DLAB HB150-S2 is a high-capacity digital dry bath featuring dual independent heating modules, each capable of reaching extreme temperatures up to 150°C. Designed for high-throughput laboratories requiring ultra-high heat, it offers precise temperature control, external sensor monitoring, and user-friendly operation for parallel processing of diverse sample types.
Key Features & Advantages:
Dual Independent Modules: Two separate heating blocks allow simultaneous operation at different protocols or the same temperature, doubling processing capacity for high-heat applications.
Ultra-High Temperature Range: Supports an extensive temperature range from ambient +5°C to 150°C for the most demanding laboratory procedures.
Precise Temperature Control: Delivers high accuracy (±0.3°C from 25-90°C; ±0.6°C from 90-150°C) and excellent uniformity (±0.2°C at 37°C).
External Temperature Sensor: Enables real-time sample temperature monitoring directly in the block for enhanced process control and verification.
User-Friendly Design: Simple knob adjustment, audible alerts, and included block lids for temperature maintenance and contamination prevention.
Safety Features: Built-in overheating protection ensures safe operation during extended high-temperature use.
Technical Specifications:
Catalog No.: 5032111210
Temperature Range: Ambient +5°C to 150°C
Temperature Control Accuracy: ±0.3°C (25-90°C) | ±0.6°C (90-150°C)
Temperature Uniformity @37°C: ±0.2°C
Time Setting Range: 0 min to 99 h 59 min
External Sensor: Yes
Power: 200W
Display: LED
Voltage/Frequency: 110/220V, 50/60Hz
Dimensions (W x D x H): 290 x 210 x 120 mm
Weight: 3.2 kg
Ideal For:
High-throughput applications requiring extreme heating, including specialized digestions, material testing, and industrial processes where dual-block capacity and temperatures up to 150°C are essential.
Why Choose the DLAB HB150-S2 Digital Dry Bath?
Because it combines extreme temperature performance with dual-module flexibility, providing efficient, precise, and safe parallel processing for the most demanding high-heat laboratory environments.