Ascent DMS Pulsed and DC Power System:
Cooling: Hybrid (air and water)
Output Frequency (MHz, kHz): 0.5 to 50 kHz
Input Voltage (V): 100 to 240 VAC
Power Level (kW): 40 to 120 kW
Rack Width: Full rack
Height (Inches): 6U, 10U
Output Voltage Range (V): 400-1000 V
Communications Interface: Ethernet, EtherCAT, DeviceNet, Profibus, RS-232/485, EtherNet/IP, and analog communications
Advanced Features: Progressive arc management
Process Applications: Deposition
Ignition Voltage (V): 1200
Compliance: EU RoHS, CE, NRTL, SEMI S2, SEMI F47
Description
Advanced Dual-Magnetron Sputtering Accessories The Ascent® /DMS series offers unprecedented power-delivery ease and control for dual-magnetron sputtering, enabling precise tuning of film characteristics. With selectable frequency, regulation mode, and duty cycle, as well as low stored energy and simplified, modular system configuration, the Ascent DMS accessory distinguishes itself as truly next-generation technology. Cost-effective, scalable, and versatile, it minimizes complexity, increases quality, and boosts throughput to enable advanced process innovation. The Ascent DMS MF-120 package provides cost-effective, mid-frequency power for standard cathodes, while delivering bipolar pulsing technology benefits.
.Key Features
Modular and scalable (40, 60, and 120 kW models configurable up to 180 kW)
Selectable frequency (500 Hz to 50 kHz)
Adjustable duty cycle — independent power ratio regulation for each magnetron
Advanced process management through a tiered approach to arc mitigation
CEX (phase synchronization)
Benefits
Increased film value: Repeatable, customizable deposited films
Lower cost of ownership and increased productivity
Higher power levels with improved stability and reduced arc damage
Easy scalability, integration, and support
Modular design allows you to pay for only what you need while enabling future capability expansion
