Panthera TEC MAT Series
Powerful solutions for material sciences, semiconductors, LCD panels, and wafers. Engineered with a clever Brightfield / Darkfield illumination concept, these systems deliver robust functionality and exceptional imaging performance for advanced industrial inspection and technical education.
Product Overview
Technical Highlights
- Optical SystemColour Corrected Infinity Optical System (CCIS)
- Field of ViewExtended 22mm FOV (+21% Visual Area)
- Nosepiece SetupReversed Quintuple (Coded and Automated)
- Incident Source3W LED with Interchangeable Temp
- Fine Focus Precision2 micrometers Minimum Precision
Contrast Capabilities
- Brightfield (BF)Supported
- Darkfield (DF)Supported (Smart Ringlight)
- Simple PolarizationSupported (Incident)
- Segmental ContrastSupported (5-Segment Mode)
- Transmitted LightOptional (39 LED Condenser)
Performance Advantages
Motic LightTracer System
Features an intelligent coded nosepiece that automatically memorizes and restores the light intensity setting for each individual objective position.
Segmental Ringlight Darkfield
Innovative 5-segment ringlight illumination allows specialized oblique incident control to effortlessly detect scratches on reflecting surfaces.
Flexible Mechanical Stages
Accommodates multiple workflow requirements with interchangeable mechanical stage sizing options including 3 inch x 2 inch and 6 inch x 4 inch surfaces.
High-Grade LD and S-APO Optics
Equipped with Plan Achromat Long Working Distance (LD) or Plan S-Apochromatic (S-APO) BD objectives for professional, high-value visual accuracy.
System Configurations
Technical Specifications
| Model | Panthera TEC MAT BF | Panthera TEC MAT BF-T | Panthera TEC MAT BD-T | Panthera TEC MAT BD |
|---|---|---|---|---|
| Optical System | Colour Corrected Infinity Optical System (CCIS) | |||
| Observation Tube | Trinocular head, Siedentopf type | |||
| Interpupillary distance (mm) | 48-75 | |||
| Trino light split | 50/50 fixed | |||
| Inclination | 25° inclined, 360° swivelling | |||
| Eyepieces | UC-WF10X/22 | |||
| Eyepieces diopter adjustment | +/-4 dot | |||
| Nosepiece | Reversed quintuple, Brightfield, coded | Reversed quintuple, Brightfield/Darkfield, coded | ||
| Objective classification | Plan Achromat LD/Plan S-APO | Plan Achromat BD/Plan S-APO BD | ||
| Objectives |
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| Objective mounting thread | W 4/5" x 1/36" (RMS standard) | M32 | ||
| Intermediate tube | Compact EpiBF intermediate | Compact EpiBD intermediate with smart segmental ringlight | ||
| Stage | 3x2" Mechanical stage or 6x4" Mechanical stage | |||
| Stage size (mm) | 180x140mm surface (3"x2") or 300x180mm surface (6"x4") | |||
| Travel range X&Y (mm) | 75x50mm movement (3"x2") or 150x100mm movement (6"x4") | |||
| Upper limit stop | Preset; adjustable | |||
| Condenser | LED condenser | |||
| Focus mechanism | Coaxial, tension adjustment | |||
| Minimum fine focus precision (um) | 2 | |||
| Z-axis movement (mm) | 35 | |||
| Illumination type (Incident light from Intermediate) |
3W LED | 3W LED, smart segmental ringlight | ||
| Illumination type (Transmitted light from stand) |
— | 0.06W 39 LEDs (LED condenser) | — | |
| Illumination interchangeability | LED color temperature interchangeability | |||
| Illumination features | Motic Light Tracer: Light memory, sleep mode, nosepiece LED light intensity and mode indicator | |||
| Connectivity | USB for external power | |||
| Power supply | 110-240V (CE) | |||
| Accessories included | power cord, dust cover, allen key, screws for metal extension support | |||
| Dimensions L x W x H (mm) | 282x210x450 | |||
| Weight (Kg) | 10 | |||
| Optional Objectives | Plan S-APO 100x/0.90 Brightfield | Plan S-APO BD 100x/0.90 Darkfield | ||
| Optional stage | 6"x4" Mechanical stage or 3"x2" Mechanical stage | |||
| Optional Analyzer, polarizer | 360 Rotatable analyzer, polarizer slider | |||
| Contrast techniques: Brightfield | Yes | |||
| Contrast techniques: Darkfield | —— | Yes | ||
| Contrast techniques: Simple Polarization (Incident) | Yes | |||
Versatile Applications
Semiconductors and Wafers
Precise defect screening, verification, and reflection control across silicon wafers and modern LCD panels.
Material Sciences
High-resolution structural mapping and analysis for complex compound industrial materials and metals.
Industrial Quality Control
Rapid inline scratch, crack, and surface polishing defect monitoring using smart oblique angle lighting.
