The eVerest® RF Generator is engineered for the semiconductor industry’s next technology node, delivering transformative plasma control through configurable multi-level pulsing, high-speed model-based frequency tuning, and intelligent IoT-enabled performance insights. With unmatched responsiveness, stability, and process adaptability, eVerest empowers innovation for sub-2 nm etch and deposition applications.
Full RF delivery system with multiple matching solutions and intelligent synchronization
Programmable multi-level pulse profiles for superior speed and control
High-speed RF output response with fast rise/fall pulse transitions
Wide frequency tuning range up to ±10% for enhanced process stability
Designed-in dP/dZ stability for reliable operation
Integrated PowerInsight™ IoT intelligence for advanced diagnostics and optimization
Enables next-generation process development for <2 nm deposition and etch
Provides reliable plasma ignition and RF stability independent of cable length
Seamlessly integrates into new and existing plasma platforms
Expands process space and widens stability windows
Supported globally with extensive applications and service resources
Cooling: Water
Output Frequency: 1–65 MHz
Input Voltage: 200/240 VAC or 400–480 VAC
Power Levels: 3–10 kW
Rack Width: Half rack or full rack
Height: 3U
Interfaces: EtherCAT, Ethernet, RS-232, DeviceNet
Advanced Features: Multi-level pulsing, arc management, CEX, MBFT
Applications: Etch, PECVD, PVD, Chamber Clean, HDP-CVD, PEALD, ALE
