Microwave plasma cleaning machine

Options
• Vacuum pump: Oil pump or dry pump;
• Up to two additional gas inlets.

NAEN Supplies offers Microwave Plasma Cleaning Equipment. They are advanced dry process using common industrial gases as raw materials, such as oxygen, nitrogen, argon, carbon tetrafluoride and many other gases. This process is rather environmentally friendly and efficient in cleaning; therefore, it has been promoted by more and more industry users.  It is suitable for wafer dry ashing or wafer surface activation and other batch processes. It is widely used in surface treaMicrowave plasma cleaningtment related applications like automobiles, batteries, biomaterials, etc. 

Applications

• Batch Wafer Surface Activation
• Batch Wafer Photoresist Removal
• Removal Of Mems Sacrificial Layers
• Descum Process

Microwave Plasma Cleaning Equipment are compact, high-performance small desktop microwave plasma cleaner designed for R&D and small-scale production applications. The equipment uses the latest high-performance components and software to accurately control process parameters. It is mainly used in semiconductors, optics, electronics, biochips and other fields to perform micro-cleaning, activation, modification, deoxidation, degumming and other applications on the surface of various materials.

Technical Data