Inductively Coupled Plasma Cleaner

Options
• Vacuum pump: Oil pump or dry pump;
• Up to two additional gas inlets.

ICP Plasma Cleaning Equipment are small quartz vacuum plasma cleaner which are dedicated to cleaning and surface activation of a wide range of materials including polymers, metals, glass and ceramics, delivering optimum adhesion properties of otherwise difficult to bond materials.

They use ICP plasma generation method, which has the characteristics of high plasma density and high dissociation rate. There is no electrode inside the vacuum chamber, which can avoid sputtering pollution. 

Quartz glass is selected as the vacuum chamber material. Quartz glass is easy to clean, high temperature resistant, has certain strength, and RF power can be completely transmitted. It is an ideal vacuum chamber material. 

2 independent inflatable pipeline. The multi-channel inflatable design can not only be flexibly filled with a single channel of different medium gases, but also can be filled with mixed gases, which is convenient for the later cleaning process. 

The control system includes automatic process control, data acquisition and recording, security chain protection and other functions. The process parameters ( cleaning power, time, etc. ) can be set or modified, and the parameters in the process can be displayed and recorded at the same time. The historical data can be called and consulted at any time.
 

Technical Data