The NE-PE05 is a space-efficient laboratory-grade plasma system specifically designed for surface activation applications. It is widely adopted by research institutes, corporate R&D centers, and low-volume manufacturing facilities.
Utilizing advanced Capacitively Coupled Plasma (CCP) technology, the system integrates a complete vacuum processing setup comprising a stainless steel cylindrical chamber, RF plasma generator, vacuum pumping system, and precision gas flow controls. The robust chamber construction ensures long-term durability and stable process performance.
Engineered to enhance substrate adhesion strength and optimize surface wettability, the NE-PE05 supports diverse applications including material bonding, functional coating, thin-film deposition, and precision assembly processes.
Applications
